Indiana University (Jacobson Research Group)
The Indiana University (Bloomington) Jacobson Research Group supports a variety of nanscale imaging programs for research and fabrication, including photolithography. Fabrication of Three-Dimensional Micro- and Nanoscale Features with Single-Exposure PhotolithographyA technique for fabricating three-dimensional micro- and nanoscale features using a single photolithographic exposure is used. This method takes advantage of the size-dependent transmission properties of small apertures to produce structures of varying height. Other techniques for 3D fabrication require multiple exposures, special means of exposure, or a gray-tone mask. Using this technique, integrated micro- to nanoscale features can be produced in one step. Feature height is controlled by varying the photomask aperture width and exposure energy. NANOSCALE IMAGING CENTER The NIC anchors a campus effort to investigate the behavior of single molecules and nanostructures, with an emphasis on medical, biological, and materials science applications. |
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