Emerging Lithographic Technologies for Nanopatterning
Ampere Tseng Arizona State University
Walt (Walter) J. Trybula SEMATECH, Texas State University - San Marcos
As devices become progressively smaller, nanofabrication is increasingly essential for the realization of nanotechnologies that require such structures. Emerging Lithographic Technologies for Nanopatterning reviews conventional and non-conventional technologies for fabricating semiconductor circuits, particularly on microchips. Emphasizing multidisciplinary principles, methodologies, and practical applications, coverage includes emerging techniques for next-generation semiconductor lithography, scanning probe microscope lithography, self-assembly, imprint lithography, and techniques specifically developed for making nanoscale particles, wires, and tubes as well as molecular circuits and devices.
Table of ContentsOptical Lithography and Basic Processes.
Next Generation Lithography with Masks.
Maskless Processes Using Energetic Beams.
Scanning Probe Microscope Lithography.
ContributorsEditor 1 Tseng, Ampere A., Arizona State University, Tempe, USA Editor 2 Trybula, Walt, SEMATECH, Austin, Texas, USA
by siebo — last modified April 22, 2008 - 11:24