Nanolithography and Patterning Techniques in Microelectronics
David Bucknall
Georgia Tech
DescriptionNanolithography and Patterning Techniques in Microelectronics examines the new range of techniques that have made it possible to develop complex patterns at the nanoscale and explores their industrial applications. This book considers ways of forming and modifying surfaces for patterning and provides information on specific patterning techniques such as soft lithography, ion beam patterning, use of nanostencils, photolithography, and inkjet printing. It also discusses prototyping and the manufacture of particular devices. With a distinguished team of contributors, this is an ideal reference for researchers and professionals using advanced polymers in such areas as microelectronics and biomedical devices. Table of ContentsBlock Copolymer Nanolithography. Surface-induced Structure Formation of Polymer Blends. Rapid Prototyping of Functional Microfabricated Devices by Soft Lithography. Chemomechanical Surface Modification of Materials for Patterning. Patterning of Confined Polymer Thin Films. Ion Beam Patterning. Nanofabrication by Shadow Deposition Through Nanostencils. Photolithography Beyond the Diffraction Limit. Inkjet Printing as a Tool in Manufacture and Instrumentation. Actuators and Patterns for Microfluidic Control. Manipulation of Biomolecules and Reactions. Nonlithographic Patterning: Application of Inkjet Printing in Organic-based Devices. High-resolution Printing Techniques for Plastic Electronics.ContributorsEditor 1 Bucknall, David G., Oxford University, UK |
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CRC Press — 2010 NanoScience and CleanTech catalog
