Univ of Illinois 2-Beam Microscope Can Monitor, Control Nanoscale Etching

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Univ of Illinois 2-Beam Microscope Can Monitor, Control Nanoscale Etching

Description A research team at the University of Illinois has developed a novel technique to etch delicate features on the surface of semiconductors, while monitoring the process in real time with nanoscale resolution. The technique uses a microscope which uses two light beams to image and carve the topography at high precision. The technique allowed researchers to determine the etch rate across space and time at every spot on the semiconductor wafer.
Imported on 29 Sep 2012, 11:41
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